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Więcej informacji o High-k Gate Dielectrics for CMOS Technology

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Opis

A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological§viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these§materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies.§Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections§with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.

Szczegóły książki

Kategoria Książki po angielsku Technology, engineering, agriculture Electronics & communications engineering Electronics engineering

• Pełny tytuł: High-k Gate Dielectrics for CMOS Technology
• Autor: Gang He, Zhaoqi Sun
• Język: Angielski
• Oprawa: Twarda
• Liczba stron: 590
• EAN: 9783527330324
• ISBN: 3527330321
• ID: 01551086
• Wydawca: Wiley-VCH Verlag GmbH
• Waga: 1240 g
• Wymiary: 245 × 176 × 32 mm
• Data wydania: 22. August 2012

Ulubione w innej kategorii

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