Code: 04949772
Atomic Layer Deposition
by Tommi Kaariainen, David Cameron, Marja-Leena Kaariainen, Arthur Sherman
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review t ... more
- Language:
English - Binding: Hardback
- Number of pages: 272
Publisher: John Wiley & Sons Inc, 2013
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Book synopsis
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Book details
Book category Books in English Technology, engineering, agriculture Electronics & communications engineering Electronics engineering
230.04 €
- Full title: Atomic Layer Deposition
- Subtitle: Principles, Characteristics, and Nanotechnology Applications
- Author: Tommi Kaariainen, David Cameron, Marja-Leena Kaariainen, Arthur Sherman
- Language: English
- Binding: Hardback
- Number of pages: 272
- EAN: 9781118062777
- ISBN: 1118062779
- ID: 04949772
- Publisher: John Wiley & Sons Inc
- Weight: 582 g
- Dimensions: 164 × 240 × 25 mm
- Date of publishing: 28. June 2013
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